等离子刻蚀机的工作原理和注意事项Working principle and precautions of plasma etcher

工作原理 平面刻蚀是在两块平面电极之间进行刻蚀，它与常见的感应耦合等离子体（ICP）不同，是通过高压线圈产生的。我们的SCE系列铝制反应舱等离子体系统是该领域Z新的产品。

等离子刻蚀机的注意事项 

#.在设备工作时,禁止扶、靠设备，禁止触摸高频电缆和线圈，以免发生意外

#.高频电源实际使用功率不能超过Z大限制#.检查设备时，必须关机后切断电源 

#. 工作场地必须保持清洁、干燥，设备上及设备周围不得放置无关物品，特别是易燃、易爆物品 

#.长期停放时注意防潮，拆除电源进线，每隔3-5天开一次机，保证反应室真空以免被污 染 

#.设备停机、过夜也要保持反应室真空，如停机较长时间后再进行刻蚀工艺，需先进行一次空载刻蚀，再刻蚀硅片

       Working principle plane etching is performed between two plane electrodes, which is different from the common inductively coupled plasma (ICP), and is produced by high-voltage coil. Our SCE series aluminum reaction chamber plasma system is the latest product in this field. 

       Precautions for plasma etching machine, 

       #.Do not hold or lean on the equipment, and do not touch the high-frequency cable and coil to avoid accidents. 

       #. The actual power of high-frequency power supply cannot exceed the maximum limit.# When checking the equipment, the power supply must be cut off after shutdown. 

       #. The working site must be kept clean and dry. No irrelevant items, especially inflammable and explosive items, shall be placed on and around the equipment. 

       #. When parking for a long time, pay attention to moisture-proof, remove the power incoming line, and open the machine every 3-5 days to ensure that the vacuum in the reaction room is not polluted.

       #. When the equipment is shut down or overnight, the vacuum in the reaction chamber shall be maintained. If the equipment is shut down for a long time, then the etching process shall be carried out. In addition, one no-load etching shall be carried out first, and then the silicon wafer shall be etched