<![CDATA[苏州赛森电子科技有限公司Suzhou Cycas Electronic Technology Co]]> zh_CN 2020-06-16 14:51:59 2020-06-16 14:51:59 YBlog RSS Generator 5 <![CDATA[KDF943i]]> <![CDATA[ECLIPSE1]]> <![CDATA[Des-212 drum type degumming machine]]> <![CDATA[P5000CVD]]> <![CDATA[NovellusC1ND-109]]> <![CDATA[NovellusC1ND-103]]> <![CDATA[Aviza/Spts]]> <![CDATA[MRC PVD(自己仓库)MRC PVD (own warehouse)]]> <![CDATA[MRC PVD(合肥)MRC PVD (own warehouse)]]> <![CDATA[MRC PVD(贵州)MRC PVD(own warehouse)]]> <![CDATA[Axcelis 8250 medium current implanter]]> <![CDATA[Nissin Exceed 3000AH medium current implanter]]> <![CDATA[EVG6200 mask aligner]]> <![CDATA[Suss Gemma Developer Cluster System]]> <![CDATA[Nexus350i]]> <![CDATA[Gasonics PEP3510 resist asher]]> <![CDATA[EVG Gemini Automated production Wafer Bond]]> <![CDATA[FEI865 dual beam]]> <![CDATA[VeecoRF350]]> <![CDATA[TEL Alpha8S diffusion furnace]]> <![CDATA[Suss FC150 Flip Chip bonder]]> <![CDATA[Suss ACS300+ coater/developer]]> <![CDATA[Gasonics PEP3510 resist asher]]> <![CDATA[CHA Mark40 Evaporator]]> <![CDATA[Gasonics L3510]]> <![CDATA[Lam TCP 9600]]> <![CDATA[P5000]]> <![CDATA[P5000]]> <![CDATA[等离子体表面处理的技术及应用Technology and application of plasma surface treatment]]> <![CDATA[等离子体表面处理的原理Principle of plasma surface treatment]]> <![CDATA[A complete set of equipment for surface modification, surface activation, etching and nano coating of plasma cleaning machine等离子体清洗机表面改性、表面活化、刻蚀、纳米涂层一台设备全搞定 A complete set of equipment for surface modification, surface activation, etching and nano coating]]> <![CDATA[怎么选等离子清洗机设备厂商呢?How to choose plasma cleaning equipment manufacturers?]]> <![CDATA[等离子清洗机效果如何评估   How to evaluate the effect of plasma cleaning machine?]]> <![CDATA[ A complete set of equipment for surface modification, surface activation, etching and nano coating of plasma cleaning machine等离子体清洗机表面改性、表面活化、刻蚀、纳米涂层一台设备全搞定]]> <![CDATA[等离子清洗机在手机行业中的应用Application of plasma cleaning machine in mobile phone industry]]> <![CDATA[等离子表面处理技术在塑料行业的应用Application of plasma surface treatment technology in plastics industry]]> <![CDATA[磁控溅射的工作原理Working principle of magnetron sputtering]]> <![CDATA[Magnetron sputtering has two characteristics of "low temperature" and "high speed"磁控溅射具有“低温”、“高速”两大特点Magnetron sputtering has two characteristics of]]> <![CDATA[What are balanced magnetron sputtering and unbalanced magnetron sputtering?什么是平衡磁控溅射和非平衡磁控溅射?]]> <![CDATA[等离子刻蚀机的检验操作及处理模式    Inspection operation and treatment mode of plasma etcher]]> <![CDATA[等离子综合性技术有哪些?What are the comprehensive plasma technologies?]]> <![CDATA[等离子刻蚀技? Plasma etching technology]]> <![CDATA[Application of plasma cleaning machine in semiconductor etching process等离子清洗机在半导体刻蚀工艺中的应用]]> <![CDATA[微波等离子干法去胶机影响因素:Influencing factors of microwave plasma dry degumming machine:]]> <![CDATA[磁控溅射各有不同工作原理和应用对象Magnetron sputtering has different working principles and application objects]]> <![CDATA[选择真空退火炉需要考虑的因素 Factors to be considered in selecting vacuum annealing furnace]]> <![CDATA[The third industrial transfer of semiconductors, Chinas decisive victory in the "battle of tianwangshan"半导体第三次产业转移,中国决?“天王山之战”]]> <![CDATA[Sputtering is to bombard the target surface with charged particles in vacuum溅射镀膜就是在真空中利用荷能粒子轰击靶表面]]> <![CDATA[磁控溅射设备的主要用途Main uses of magnetron sputtering equipment]]> <![CDATA[微波等离子去胶机操作规程 Operation procedures of microwave plasma degummer:]]> <![CDATA[真空退火炉工艺布置及高温密封圈概况Process layout and high temperature sealing ring of vacuum annealing furnace]]> <![CDATA[In the plasma degumming machine, what is the main gas that plays a degumming role?在等离子去胶机中主要起到去胶作用的气体是什么?]]> <![CDATA[磁控溅射种类?Magnetron sputtering type?]]> <![CDATA[等离子干法去胶机反应机理:Reaction mechanism of plasma dry degumming machine:]]> <![CDATA[PVD沉积方式的比较Comparison of PVD deposition methods]]> <![CDATA[Study on the properties of aluminum plating by electron beam evaporation and magnetron sputtering电子束蒸发与磁控溅射镀铝性能分析研究]]> <![CDATA[Principle and solution of medium frequency magnetron sputtering coating technology中频磁控溅射镀膜技术的原理及问题解答]]> <![CDATA[蚀刻机腐蚀加工蚀刻网片的工艺流程Process flow of etching mesh by etching machine]]> <![CDATA[金属化学蚀刻机的步骤Steps of metal chemical etching machine]]> <![CDATA[金属标牌腐蚀机的蚀刻液蚀刻工艺介绍Introduction to etching process of etching solution of metal plate etching machine]]> <![CDATA[教您如何为金属蚀刻机调配油墨!Teach you how to mix ink for metal etching machine!]]> <![CDATA[蚀刻机喷头的作用及维护Function and maintenance of etcher nozzle]]> <![CDATA[金属化学蚀刻机的步骤Steps of metal chemical etching machine]]> <![CDATA[Why cant the development of etching machine always show through?蚀刻机腐蚀技术之为什么有时显影总显不透?]]> <![CDATA[快速退火炉维修注意事项:Precautions for maintenance of rapid annealing furnace:]]> <![CDATA[Whats the difference between metal etching and manual etching?蚀刻机用途金属腐蚀和人工腐蚀加工的区别?]]> <![CDATA[带RIE等离子刻蚀机处理模式介绍The introduction of processing mode of plasma etching machine with RIE]]> <![CDATA[微波等离子去胶机工作原理及应用Working principle and application of microwave plasma degummer]]> <![CDATA[金属腐蚀机与激光蚀刻机的区别The difference between metal etching machine and laser etching machine]]> <![CDATA[金属化学蚀刻机的发展简史Brief history of the development of metal chemical etching machine]]> <![CDATA[蚀刻机喷头的作用及维护Function and maintenance of etcher nozzle]]> <![CDATA[钛合金的蚀刻机加工工艺Etching machining technology of titanium alloy]]> <![CDATA[蚀刻机喷头的作用及维护Function and maintenance of etcher nozzle]]> <![CDATA[Why cant sputter coating completely replace thermal evaporation coating?溅射镀膜为什么不能完全取代热蒸发镀膜?]]> <![CDATA[蚀刻机腐蚀前处理工艺详解A detailed explanation of the pretreatment process of etching machine]]> <![CDATA[Factors affecting the degreasing of alkaline solution before etching the label of etching machine蚀刻机蚀刻标牌之前影响碱液除油的的因素]]> <![CDATA[快速退火炉的维修注意事项Precautions for maintenance of rapid annealing furnace]]> <![CDATA[Application of plasma treatment machine in surface modification of materials等离子处理机在材料表面改性中的应用]]> <![CDATA[等离子体干法去胶工艺原理及使用Principle and application of plasma dry degumming machine ]]> <![CDATA[不锈钢装饰蚀刻技术?Stainless steel decorative etching technology?]]> <![CDATA[CCTV: Chinas micro and medium enterprises officially announced to master the 5nm etching machine technology!央视 : 中国中微正式宣布掌握5nm刻蚀机技?]]> <![CDATA[Precautions for use and routine maintenance of c406 magnetron sputtering equipmentC406磁控溅射设备使用及日常保养注意事项]]> <![CDATA[High density plasma etching is a key step in VLSI manufacturing高密度等离子体刻蚀是当今超大规模集成电路制造过程中的关键步骤]]> <![CDATA[如何操作微波等离子去胶机?How to operate microwave plasma degummer?]]> <![CDATA[小型等离子去胶机在工作时的表现Performance of small plasma degummer in operation]]> <![CDATA[等离子刻蚀机的缺点?Disadvantages of plasma etcher?]]> <![CDATA[快速退火炉维修注意事项:Precautions for maintenance of rapid annealing furnace:]]> <![CDATA[Study on the properties of aluminum plating by electron beam evaporation and magnetron sputtering电子束蒸发与磁控溅射镀铝的性能分析研究]]> <![CDATA[带RIE等离子刻蚀机处理模式介绍The introduction of processing mode of plasma etching machine with RIE]]> <![CDATA[Chinas etching machine has successfully killed Japan and South Korea, and its high-end manufacturing goes to the world, with the technology reaching one thousandth of the hair中国刻蚀机成功秒杀日韩,高端制造走向世界,工艺达发丝万分之一]]> <![CDATA[Chinas plasma etching machine has reached the advanced level in the world中国等离子体刻蚀机达到世界先进水平]]> <![CDATA[小型等离子去胶机在工作时的表现Performance of small plasma degummer in operation]]> <![CDATA[蚀刻机腐蚀加工蚀刻网片的工艺流程Process flow of etching mesh by etching machine]]> <![CDATA[2018 China semiconductor material and equipment industry development conference held2018中国半导体材料及设备产业发展大会举行]]> <![CDATA[Etching is one of the key technologies to determine the feature size刻蚀是决定特征尺寸的核心工艺技术之一]]> <![CDATA[微波等离子去胶机操作规程 Operation procedures of microwave plasma degummer:]]> <![CDATA[感应耦合等离子体刻蚀机结构Structure of inductively coupled plasma etcher]]> <![CDATA[Reactive ion etching machine is an independent RIE reactive ion etching system反应离子刻蚀机是一款独立式RIE反应离子刻蚀系统]]> <![CDATA[Microwave plasma dry degumming machine operation and personnel微波等离子干法去胶机操作及配合人员防护:]]> <![CDATA[What is the working principle of the plasma etcher in the solar cell制作太阳能电池中的等离子刻蚀机的工作原理是怎么样的]]> <![CDATA[等离子刻蚀机的典型应用包括哪些?What are the typical applications of plasma etcher?]]> <![CDATA[什么公司会用到等离子刻蚀机What company will use plasma etching machine]]> <![CDATA[Measurement and control of plasma etching in plasma etcher等离子刻蚀机的等离子刻蚀的测量与控制]]> <![CDATA[What is intermediate frequency magnetron sputtering?]]> <![CDATA[赛森电子科技是做什么的?What does saisen electronic technology do?]]> <![CDATA[刻蚀的具体过程可描述几个步骤?How many steps can be described in the etching process?]]> <![CDATA[等离子刻蚀机通常有几种形式?How many kinds of plasma etchers are there?]]> <![CDATA[Technical characteristics of rie-pe etcher and some data analysisRIE-PE刻蚀机技术性的特点以及一些资料分析]]> <![CDATA[全自动磁控溅射系统技术分类Technical classification of fully automatic magnetron sputtering system]]> <![CDATA[Is plasma etching (dry etching) and plasma cleaning one thing等离子蚀刻机(干刻)与等离子清洗机是一件事吗]]> <![CDATA[刻蚀的具体过程可描述为如下六个步骤The specific etching process can be described as the following six steps]]> <![CDATA[等离子刻蚀机的应用Application of plasma etcher]]> <![CDATA[反应离子刻蚀机检验操作及判断Inspection operation and judgment of reactive ion etching machine]]> <![CDATA[如何操作微波等离子去胶机?How to operate microwave plasma degummer?]]> <![CDATA[什么是全自动型磁控溅射?What is a fully automatic magnetron sputtering table?]]> <![CDATA[Classification of different processes in semiconductor manufacturing在半导体制造业中,各种不同的工艺的分类]]> <![CDATA[等离子去胶机主要用于哪些方面?What are the main uses of plasma degumming machine?]]> <![CDATA[On semiconductor equipment (1) -- source and status of domestic semiconductor equipment论半导体设备(一?--国内半导体设备来源及状况]]> <![CDATA[蚀刻机产业的全新时代A new era of etcher industry]]> <![CDATA[如何提高磁控溅射台的溅射效率?How to improve sputtering efficiency of magnetron sputtering table?]]> <![CDATA[The sputtering process involves complex scattering process and multiple energy transfer processes溅射过程中涉及到复杂的散射过程和多种能量传递过程]]> <![CDATA[等离子刻蚀工艺--装片Plasma etching process -- chip loading]]> <![CDATA[How to improve the utilization rate is the key point of vacuum magnetron sputtering coating industry如何提高利用率是真空磁控溅射镀膜行业的重点]]> <![CDATA[  The application of plasma etcher in PCB industry等离子刻蚀机在PCB线路板行业去胶渣制程的应用]]> <![CDATA[赛森电子带您了解高真空磁控溅射台Cycas electronics show you the high vacuum magnetron sputtering table]]> <![CDATA[什么公司会用到等离子刻蚀机?What companies use plasma etchers?]]> <![CDATA[等离子技术在汽车工业的使用Application of plasma technology in automobile industry]]> <![CDATA[磁控溅射台设备用途和功能特点Application and function of magnetron sputtering equipment]]> <![CDATA[你知道等离子去胶机的原理?Do you know the principle of plasma degummer?]]> <![CDATA[等离子表面处理设备是怎样使用的?How is plasma surface treatment equipment used?]]> <![CDATA[赛森电子科技告诉你磁控溅射的种类Cycas electronic technology tells you the type of magnetron sputtering]]> <![CDATA[湿法刻蚀相对于等离子刻蚀的缺点Disadvantages of wet etching compared with plasma etching]]> <![CDATA[半导体设备硅刻蚀机概述Overview of silicon etcher for semiconductor equipment]]> <![CDATA[Chinas plasma etching machine has reached the advanced level in the world中国等离子体刻蚀机达到世界先进水平]]> <![CDATA[磁控溅射的工作原理是什么?What is the working principle of magnetron sputtering?]]> <![CDATA[等离子刻蚀机的工作原理和注意事项Working principle and precautions of plasma etcher]]> <![CDATA[干法去胶工艺原理及使用?Principle and application of dry degumming process?]]> ձŷպĻ